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Figure 1
USP467 solvents by headspace analysis/GC on an
Rtx®-G43 colu mn .
A) Static headspace (loop) technique
RetentionTime (min.)
l. dichloromethane
2. chloroform
3. benzene
4. trichloroethylene
5. 1,4-dioxane
5.n O
9.285
1Ll73
14.647
17.436
4
I
I
I
Sample Concentration
~g/ml)
12.0
l.2
0.04
l. 6
7.6
of the vial, to sweep the analytes onto an activated
trap. The trap , with the concentrated analytes, was
dry purged to remove the water vapor, then was
heated without flow to desorb the analytes. After
the analytes were desorb ed, the trap was back
flushed to direct the concentrated analytes onto
the analytical column. Between analyses, the trap
was baked at high tempe rature to remove all
residue compounds.
When we compared the results of the system suit
ability analyses for the two headspace techniques,
we determined that, based on area responses, the
dynamic headspace meth od greatly enhanced sen
sitivity for the target Ov ls: area counts were, on
average, 22 times larger than for the static head
space method (Table
1).
We also noted that the
Rtx®-G43capillary column provided excellent res
olution among analytes, with very little drift in
retentio n time or resolution (Table 2).
As with purge and trap systems, or other dynamic
sampling systems, certain system control s must be
taken into account when using a dynamic head
space technique. Factors to consider include
sweeping and desorbing times and flows, adsor bent materials used to trap the analytes, and water
management. In this specific appl ication , we
observed that either prolonged samp le heat ing at
80°C or extended vial sweep times increased the
water content in the sample headspace, ultimately
resulting in poor peak shape for l,4-dioxane and ,
if excessive, extinguishing the FID. 1,4-Dioxane
has a notoriously poor partitioning efficiency and
proved to be the limiting factor when setting sys
tem operating conditions. For samp les heated at
80-85°C in a water matrix, a sweep time of 5 min
utes or less enhanced sensitivity for all compounds
while assurin g proper water man agement.
From this work, we conclude that coupling a
dyn amic headspace sampling technique with
analysis on an Rtx®-G43 column greatly increases
sensitivity for residual solvents, and makes stable
retentio n possible. These enhancem ents can lead
to more achievable system suitability criteria and
lower detection limits, or to effective results with
smaller samples.
Rtx®-G43 Column
(fused silicawith 5-meter
lnteqra-Guard'")
(Crossbond" 6%cyanopropylphenyl/94% dimethyl polysiloxane)
ID
dt
~m)
temp. limits
length cat
#
0.53mm 3.00
-20 to 240°C
30-Meter 16085-126
GCPH00810
Instrument:
Sample Equilibr,Time:
Mixing:
Mixer StabilizeTime:
Valve OvenTemp.:
Transfer LineTemp.:
StandbyFlow Rate:
1'0
Time (min.)
TeledyneTekmar HT3
15.00min.
levelS, 2.00min.
0.50 min.
150°C
150°C
10mL/min.
10
Platen/SampleTemp.:
80°C
PlatenTemp.Equilibr;Time: 2.00 min.
Pressurize:
15psi, 2.00min.
Pressurize
Equifthr.
Time: 0.50min.
Loop Fill Pressure:
5 psi
LoopFillTime:
2.00min.
Loop FillEQuilibr.Time:
0.50 min.
InjectTime:
1.00 min.
B) Dynamic headspace (trap) technique
RetentionTime(min.)
l. dichloromethane
5.137
2. chloroform
9.260
3. benzene
1Ll45
4. trichloroethylene
14.601
5. 1A·dioxane
17.349
4
SampleConcentration
~g/ml)
12.0
l. 2
0.04
l.6
7.6
io
10
Time(min.)
Instrument:
TeledyneTekmar HT3
TrapStandbyTemp.:
40°C
Sample Equilibr,Time:
15.00 min.
Platen/ SampleTemp.:
80°C
Mixing:
level S, 2.00 min.
Sweep Flow:
75mL/ min., 3.00 min.
Mixer StabilizeTime:
0.50 min.
Dry Purge:
50mL/ min.,
ValveOvenTemp.:
150°C
5.00 min., 25°C
Transfer LineTemp.:
150°C
Desorb Preheat:
245°C
StandbyFlow Rate:
10mL/min.
Desorb:
l.00 min., 250°C
Trap 8ake:
450mL/min.,
6.00 min., 300°C
Chromatography Conditions
Column:
Rtx*-G4330m, 0.53mm!D,
3.0f.lm(cal.# 16085-126)
Sample:
100f.lLUSP467CalibrationMixture #5 (cal.# 36007) in dimethylsulfoxide, 5mL
water, -
l.Ogsodium sulfatein 22mLheadspacevial. Concentrationslistedon
figure.
Ini.:
staticheadspaee or dynamic headspace
Inj. temp.:
180°C
Carrier gas:
helium, split 2:1
Linear velocity:
5mL/min., constant flow
Oven temp.:
40°C(20min.), to 240°C@ 25°C/ min. (hold 10min.)
Del.:
F!D @ 250°C
hydrogen flow: 40mL/min.; air flow: 450mL/min.;make-up flow: 45mL/ min.
2006 vol. 1
• 15 •
Website :
www.chromtech.net.auE-mail :
info@chromatech.net.auTelNo : 03 9762 2034 . . . in AUSTRALIA