VICI-Valco Catalog #60 289p - page 227

instrumentation
226
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Gas Purifiers
Helium and Nitrogen Purifiers
Helium purifier
CE certified
Gases purified
He, Ne, Ar, Kr, Xe, Rn
Maximum operating pressure 1000 psig
Impurities removed
Outlet impurities less than 10ppb
H
2
O, H
2
, O
2
, N
2
, NO, NH
3
, CO, CO
2
, and CH
4
,
based on 10ppm total inlet impurities.
Other impurities removed include
CF
4
, CCl
4
, SiH
4
and light hydrocarbons.
Impurities
not
removed
He, Ne, Ar, Kr, Xe, Rn
Nitrogen Purifier
CE certified
Gases purified
N
2
only
Impurities removed
Outlet impurities less than 10ppb
H
2
O, H
2
, O
2
, NO, NH
3
,CO, CO
2
, and CH
4
,
based on 10ppm total inlet impurities.
Other impurities removed include
CF
4
, CCl
4
, SiH
4
and light hydrocarbons.
Impurities
not
removed
He, Ne, Ar, Kr, Xe, Rn, N
2
Carrier gas purity is essential in
any application requiring extreme
sensitivity. Impurities limit detector
sensitivity and can even destroy
capillary columns. The Valco HP2
provides “point-of-use”purification of
helium or other noble gases, such as
Ar, Ne, Kr, and Xe, to sub-ppm levels of
reactive gaseous impurities. The NP2 is
similar, purifying nitrogen to sub-ppm
levels of gaseous impurities.
The purification substrate in Valco
gas purifiers is a non-evaporable
gettering alloy. This stable alloy is
contained in a welded assembly, so
the purifiers can be used safely in
industrial applications with minimal
precautions. The getter is activated by
heating, which eliminates the oxide
film on the particle surface and allows
helium to diffuse into the bulk of the
getter particles. The HP2 and NP2
feature a self-regulating design which
eliminates the possibility of thermal
runaway and maintains the getter
material at the optimum temperature.
Standard helium and nitrogen purifiers
Includes universal power supply.
Helium purifier
Nitrogen purifier
Description Prod No
Prod No
110 VAC
HP2
NP2
230 VAC
HP2-220
NP2-220
Replacement getter assembly
Helium I-23572HP2
Nitrogen
I-23572NP2
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